Clean Room

Clean Room

Plasma cleaner SBT-150

 • Low energy plasmas can be used to reactively etch or remove organic materials found on the surface of inorganic materials.

 • The specimen holder and specimen are subjected to reactive gas plasma prior to electron microscope analysis.

Clean Room

Mask Liner

 • Mask Liner can selectively remove parts of a thin film using a mask, UV light and corresponding photoresist. This technology is widely used in microfabrication.

Clean Room

Spin Coating System

 • Spin Coating is a technique to make uniform thin film on flat substrates. The process is to add some amount of solution to the substrate and rotate the substrate at high speed to spread the solution by central force.